Introducing the Next Generation Rado/Taso Platform
We’re excited to announce the launch of our next generation Rado/Taso platform! These past two years of development were focused on meeting our customers’ needs for improved reliability, scalability, and probe alignment. We were especially keen on providing engineered solutions to meet the evolving needs of our customers as they bring our Rado/Taso from lab and R&D environments into full-scale commercial manufacturing.
This next-gen release delivers significant performance and reliability enhancements, while maintaining full feature and product-facing geometric compatibility for seamless plug-and-play replacement with existing systems.
Key Improvements
- Enhanced wiping performance to decrease probe fouling even further
- Increased robustness for continuous 24/7 deployment in demanding environments
- New face seal to minimize moisture and material build-up in hygienic flange dead space, improving wet-down efficiency
- Redesign of probe connection for near-perfect flush alignment with the wiping surface and repeatable probe insertion depth
We added these enhancements and kept the same form factor of the Rado/Taso, so that this next-gen release can be a drop-in replacement for existing systems without needing to reengineer process equipment.
These upgrades ensure the Rado/Taso platform continues to support 24/7 PAT measurements in even the most demanding conditions. Our PAT-to-process interfaces are proven to improve Process Analytical Technology (PAT) deployments in granulation, milling and spray drying unit operations, across the agricultural, food and pharmaceutical (cGMP) industries.
For more details, visit our updated product pages for Rado and Taso, or reach out to our team.
The 2nd Gen Rado/Taso is now available for order.



